FILM DEPOSITION METHOD AND FILM DEPOSITION APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a technology of forming a laminar graphite-based thin film on a substrate having a conductive surface. SOLUTION: A film deposition apparatus 1 has a vacuum vessel 2 to which a predetermined reaction gas can be introduced, and an electric field generating means 6 to generate an AC electric field in a predetermined direction is provided in the vacuum vessel 2. The electric field generating means 6 comprises a rectangular annular core 60 and a coil 9 wound around the core 60. The AC electric field is generated in the direction along the substrate 50 by applying high frequency power to the coil 9, and applied to the substrate 50.