发明名称 METHOD FOR PRODUCING HEXAFLUOROETHANE AND USE THEREOF
摘要 PROBLEM TO BE SOLVED: To provide both a method for industrially and advantageously producing a high-purity hexafluorothane usable as an etching gas or a cleaning gas and the use thereof. SOLUTION: This method for producing the hexafluoroethane comprises (1) a step of reacting pentafluoroethane containing a chlorine-containing compound having 1-3 carbon atoms with hydrogen in the presence of a hydrogenating catalyst in the vapor phase at 150-400 deg.C and hydrogenating the chlorine- containing compound and (2) reacting the resultant product in the step (1) with fluorine in the presence of a diluting gas in the vapor phase and producing the hexafluoroethane.
申请公布号 JP2003055277(A) 申请公布日期 2003.02.26
申请号 JP20010247380 申请日期 2001.08.16
申请人 SHOWA DENKO KK 发明人 ONO HIROMOTO;OI TOSHIO
分类号 C11D7/30;C07B61/00;C07C17/10;C07C17/25;C07C19/08;C09K13/08;C11D7/50;H01L21/302;H01L21/3065;(IPC1-7):C07C17/10;H01L21/306 主分类号 C11D7/30
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