摘要 |
PROBLEM TO BE SOLVED: To suppress side etching as far as possible. SOLUTION: In carrying out etching of laminated films consisting of silver or a silver alloy by using an etching solution consisting of mixed acids composed of a phosphoric acid, nitric acid and acetic acid, the etching solution is made to flow and the flow intensity thereof is specified to a range from the fluid intensity at which the etching reaction starts up to the fluid intensity of 67% thereof.
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