发明名称 Positioning apparatus and exposure apparatus, method of operating a positioning apparatus and device manufacturing method
摘要 <p>Positioning apparatus arranged in a vacuum atmosphere comprises: a supporting means including a combination of a magnet arranged on a bottom plate and an electromagnet arranged on a top plate so that the spring element can virtually be disregarded; and a linear motor enabling driving for performing positioning of a substrate subjected to positioning without a contact and including a magnet on a movable member side and a coil on a stationary member side. The positioning apparatus employs a noncontact heat controller to externally control the temperature of the substrate without a contact, through a radiation plate, Peltier element and cooling plate supported by a supporting member of the bottom plate, and a black body arranged on the top plate opposed to the radiation plate. &lt;IMAGE&gt;</p>
申请公布号 EP1286221(A2) 申请公布日期 2003.02.26
申请号 EP20020255684 申请日期 2002.08.14
申请人 CANON KABUSHIKI KAISHA 发明人 EMOTO, KEIJI
分类号 G03F7/20;G05D3/12;G05D23/27;H01L21/027;(IPC1-7):G03F7/20;H01L21/00 主分类号 G03F7/20
代理机构 代理人
主权项
地址