发明名称 Lithographic apparatus and device manufacturing method
摘要 A Lorentz actuator for providing a force between a first part and a second part of the apparatus, comprising a main magnet system, attached to a first part of the apparatus and providing a first magnetic field; a subsidiary magnet system, attached to said first part and arranged in a Halbach configuration, providing a second magnetic field; and an electrically conductive element attached to a second part of the apparatus and arranged so as to produce a force between said first and second parts of the apparatus by interaction of an electric current carried by said electrically conductive element and the combination of the first and second magnetic fields. <IMAGE>
申请公布号 EP1286222(A1) 申请公布日期 2003.02.26
申请号 EP20020255759 申请日期 2002.08.19
申请人 ASML NETHERLANDS B.V. 发明人 HOL, SVEN ANTOIN JOHAN;VAN EIJK, JAN;DE KLERK, ANGELO CESAR PETER;VAN DER SCHOOT, HARMEN KLAAS
分类号 G03F7/20;H02K41/035;(IPC1-7):G03F7/20 主分类号 G03F7/20
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