| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for cleaning a plate face by which an efficient contaminant removing capability is exhibited and at the same time, the resistance to plate wear of a printing plate is not deteriorated, in the printing plate manufactured based on a photopolymerization-type photosensitive lithographic printing plate. SOLUTION: The photopolymerization-type photosensitive lithographic printing plate comprising a support, a photopolymerizable photosensitive layer and an oxygen barrier protecting layer is subjected to an image exposure and a development process. Next, the plate face of the obtained lithographic printing plate is cleaned using an emulsion plate face cleaning agent containing a soyabean saccharide, as the steps of the method for cleaning the plate face of the lithographic printing plate. |
