发明名称 RAMAN PHOTOMETRIC APPARATUS, FILM THICKNESS MEASURING INSTRUMENT, METHODS THEREFOR, FILM FORMING APPARATUS AND METHOD THEREFOR
摘要 PROBLEM TO BE SOLVED: To measure film thickness with high accuracy without being affected by the reflactivity of a substrate surface, in allowing a base film 10 with a magnetic film to run through an internally evacuated DLC film forming apparatus 20, and forming a DLC film on the base film from a film forming source 2. SOLUTION: The reflectivity of the base film 10, before the DLC film is formed, is measured by a reflectiometer 26. The same place as the measured place of the film 10 is observed by Raman spectroscopy to measure the strength of the film at every wavelength of 1,000-1,800 cm<-1> , and the area value RS of the Raman peak appearing in this range is calculated by an analyzing computer 41. On the basis of the measured reflectivity and the area value RS of the Raman peak, a film thickness converting computer 42 operates film thickness=A×RS+B. Since the function f (r) using the reflectivity (r) always measured by the reflectiometer 26 enters the coefficient A of reflectivity, the coefficient A of reflectivity changes corresponding to a change in reflectivity to accurately and stably measure film thickness.
申请公布号 JP2003057010(A) 申请公布日期 2003.02.26
申请号 JP20010248731 申请日期 2001.08.20
申请人 SONY CORP 发明人 TANABE KEISUKE;OKINA CHISATO
分类号 G01B11/06;G01N21/65;G11B5/72;G11B5/84;G11B5/85;G11B5/851;(IPC1-7):G01B11/06 主分类号 G01B11/06
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