METHOD AND DEVICE FOR FOCUS MONITOR, AND MANUFACTURING METHOD OF SEMICONDUCTOR

摘要

PROBLEM TO BE SOLVED: To provide a method and a device for focus monitor which have a high detection sensitivity in the z direction and don't require replacement of an illumination aperture and to provide a manufacturing method of a semiconductor device. SOLUTION: The focus monitor method uses modified illumination to transfer the pattern of a photo mask 5 for phase shift focus monitor to a photo resist 21b on a semiconductor substrate 21a. The photo mask 5 for phase shift focus monitor has first and second light transmission parts 5c and 5d adjacent to each other across a light shielding pattern 5b between them and is so constituted that a phase difference other than 180 deg. may be given for respective exposure light transmitted through the first and second light transmission parts 5c and 5d.