发明名称 |
LOAD CUP FOR MECHANICAL AND CHEMICAL POLISHING DEVICE, MECHANICAL AND CHEMICAL POLISHING DEVICE, AND TRANSFER METHOD FOR SUBSTRATE |
摘要 |
PROBLEM TO BE SOLVED: To provide a load cup for a mechanical and chemical polishing device, a mechanical and chemical polishing device, and a transfer method for a substrate capable of securely transferring the substrate held on a polishing head to a substrate support member of the load cup. SOLUTION: This load cup 4 of a CMP device 1 has a pedestal 12 supporting a wafer W, and three substrate grip members 23 gripping the wafer W by pressing an edge of the wafer W are arranged on a side of the pedestal 12. Each substrate grip member 23 has two protruding parts 26 for pressing protruding inward, and a claw part 27 for catching and holding the wafer W is provided on a pressing face of the protruding part 26 for pressing. A tapered face 27a inclined downward is formed in the claw part 27. Each substrate grip member 23 is connected to an L-shaped arm 28, which is turned by an air cylinder 30 to open and close each substrate grip member 23. |
申请公布号 |
JP2003053661(A) |
申请公布日期 |
2003.02.26 |
申请号 |
JP20010247236 |
申请日期 |
2001.08.16 |
申请人 |
APPLIED MATERIALS INC |
发明人 |
KITAJIMA TOMOHIKO;TOMITA TOSHIICHI |
分类号 |
B24B37/04;H01L21/304;H01L21/68;H01L21/683 |
主分类号 |
B24B37/04 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|