DECOMPOSITION TREATMENT CONTROL METHOD IN CHLOROFLUOROCARBON DECOMPOSITION APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a decomposition treatment control method in a chlorofluorocarbon (Fron (TR), flon) decomposition apparatus capable of eliminating the need for troublesome work and stably securing the decomposition rate of chlorofluorocarbon at a high level. SOLUTION: In the chlorofluorocarbon decomposition apparatus for decomposing chlorofluorocarbon by plasma in a decomposition chamber 1 and introducing the decomposition gas into a treatment liquid for making harmless, the emission wavelength of plasma arc Pa at the decomposition chamber 1 is measured and the type of chlorofluorocarbon is specified based on the measurement result, and the amount of fed chlorofluorocarbon, the amount of supply of vapor, and the amount of air are controlled according to the specified type of chlorofluorocarbon. The emission wavelength of the plasma arc Pa is measured with a spectroscope 11a through an observation port 11 that is provided at the decomposition chamber 1.