| 摘要 |
PROBLEM TO BE SOLVED: To well clean the surface of a substrate. SOLUTION: Before the cleaning of the electrode side of a substrate 2 with a substrate cleaning mechanism is started, the elapsed time t measured by a measuring device 25 after the completion of dripping of a solvent 14 onto a cleaning cloth 8 is compared, by a comparison judgment section 27, with an allowable time T memorized in a memory section 26 in order to judge whether the elapsed time t measured by the measuring device 25 exceeds the allowable time T or not. When the elapsed time is judged to be longer than the allowable time T, the solvent 14 is dripped again onto the cleaning cloth 8.
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