发明名称 Copolymer for improving the chemical and developer resistance of positive working printing plates
摘要 Copolymers useful in radiation-sensitive layers of printing plates have the units A, B and Cwherein unit A is present in an amount of 5 to a maximum of 50 mol % and R1 and R4 are selected such that the homopolymer of A is alkali-soluble, B is present in an amount of 20-70 mol % and R2, R6 and R7 are selected such that the homopolymer of B has a high glass transition temperature, and C is present in an amount of 10-50 mol % and R3 and R5 are selected such that the homopolymer of C is water-soluble and that unit A is different from unit C.
申请公布号 US6525152(B1) 申请公布日期 2003.02.25
申请号 US20000630917 申请日期 2000.08.02
申请人 KODAK POLYCHROME GRAPHICS LLC 发明人 JAREK MATHIAS
分类号 C08F222/40;G03F7/023;(IPC1-7):C08F222/40;C08F122/40 主分类号 C08F222/40
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