发明名称 Nonvolatile semiconductor memory device
摘要 In a nonvolatile semiconductor memory device, in which programming operation of data is conducted by injecting hot electron generated between a source layer and a drain layer of a memory cell into a floating gate between the both layers on an upper potion of surface of a semiconductor, while verification of the data programmed is conducted by making discrimination on whether voltage applied to the drain is kept or not, depending upon a height of a threshold voltage of the memory cell.
申请公布号 US6525968(B2) 申请公布日期 2003.02.25
申请号 US20020173305 申请日期 2002.06.18
申请人 HITACHI, LTD.;HITACHI DEVICE ENGINEERING CO., LTD. 发明人 SAEKI SHUNICHI;KURATA HIDEAKII;KOBAYASHI NAOKI
分类号 G11C16/02;G11C11/56;G11C16/28;G11C16/34;H01L21/8247;H01L27/115;H01L29/788;H01L29/792;(IPC1-7):G11C16/00 主分类号 G11C16/02
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