发明名称 |
Method of manufacturing phase grating image sensor |
摘要 |
A method of manufacturing a phase grating image sensor is disclosed. The method uses conventional photolithography and etching methods to form a plurality of phase grating lenses into the conventional flattening layer on which the conventional micro-lens is formed. The invention thus utilizes phase gratings to replace the conventional micro-lens.
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申请公布号 |
US6524772(B1) |
申请公布日期 |
2003.02.25 |
申请号 |
US20010943017 |
申请日期 |
2001.08.30 |
申请人 |
UNITED MICROELECTRONICS CORP. |
发明人 |
HUANG CHIN-WEN;SHIU JIAN-BIN |
分类号 |
G02F7/00;H01L21/70;H01L27/14;H01L27/146;(IPC1-7):H01L27/14 |
主分类号 |
G02F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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