发明名称 |
Thin-film forming chemical adsorption material, producing method thereof and applications thereof |
摘要 |
A thin film forming chemical absorption material including at least a functional group of the formula CF3-CF2-CH2-O-(benzene)-CH=CH-C(O)-(benzene)- and a -SiX group (X represents halogen) as an end group bonded by siloxane bond. The chemical absorption material can form a monomolecular thin-film having photosensitive groups that are transparent and stable in a visible light region and cause photochemical reaction in an ultraviolet region. A liquid crystal alignment film includes an aggregation of adsorption molecules chemically absorbed directly on a surface with electrodes or chemically adsorbed indirectly thereon through another material layer having a characteristic group the formula above and a -O-Si bond group at a molecular end group. The liquid crystal alignment film is uniformly and strongly anchored on the substrate, has excellent thermal alignment stability, alignment controllability, and a film thickness permitting formation with good productivity.
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申请公布号 |
US6524715(B1) |
申请公布日期 |
2003.02.25 |
申请号 |
US20010786158 |
申请日期 |
2001.03.01 |
申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. |
发明人 |
OOTAKE TADASHI;OGAWA KAZUFUMI;NOMURA TAKAIKI;TAKEBE TAKAKO |
分类号 |
C07F7/02;C07F7/12;(IPC1-7):B32B9/04 |
主分类号 |
C07F7/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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