发明名称 |
Ion implanter and beam stop therefor |
摘要 |
A beam stop (23) has a charge collecting member (40) which extends in the direction of scanning of a scanned beam by less than the total distance scanned, so that variation in the charge signal derived from the collecting member can provide a timing signal for use in monitoring alignment of the scanned beam. In a preferred embodiment, the beam stop plate (42) has slits (65-69) leading to apertures (60-64) containing charge collecting rods (73-75) located within the thickness of the beam stop plate (42).
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申请公布号 |
US6525327(B1) |
申请公布日期 |
2003.02.25 |
申请号 |
US20000686803 |
申请日期 |
2000.10.12 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
MITCHELL ROBERT JOHN CLIFFORD;WAUK MICHAEL T.;RUFFELL JOHN;GLAVISH HILTON;KINDERSLEY PETER |
分类号 |
H01J37/244;H01J37/317;H01L21/265;(IPC1-7):H01J37/304 |
主分类号 |
H01J37/244 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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