发明名称 Ion implanter and beam stop therefor
摘要 A beam stop (23) has a charge collecting member (40) which extends in the direction of scanning of a scanned beam by less than the total distance scanned, so that variation in the charge signal derived from the collecting member can provide a timing signal for use in monitoring alignment of the scanned beam. In a preferred embodiment, the beam stop plate (42) has slits (65-69) leading to apertures (60-64) containing charge collecting rods (73-75) located within the thickness of the beam stop plate (42).
申请公布号 US6525327(B1) 申请公布日期 2003.02.25
申请号 US20000686803 申请日期 2000.10.12
申请人 APPLIED MATERIALS, INC. 发明人 MITCHELL ROBERT JOHN CLIFFORD;WAUK MICHAEL T.;RUFFELL JOHN;GLAVISH HILTON;KINDERSLEY PETER
分类号 H01J37/244;H01J37/317;H01L21/265;(IPC1-7):H01J37/304 主分类号 H01J37/244
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