| 摘要 |
An abrasive particle detention system includes a fluid circulation system, a probe assembly, a monitoring circuit, and an operator indicator. The probe assembly includes an orifice from which a stream of fluid emerges, and a probe having a face upon which the stream at least partially impinges. The probe face includes an insulative substrate and a conductive film formed on the substrate. Abrasive particles in the fluid stream abrade the conductive film, changing its electrical resistance. A monitoring circuit is utilized to observe these changes, and when they correspondence to a concentration above a pre-selected level, an operation indicator is triggered. The system may include an electronic controller coupled to the monitoring circuit, which can account for variables such as temperature, viscosity, and/or pressure in the fluid circulation system.
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