发明名称 |
Reticle design for alternating phase shift mask |
摘要 |
The present invention provides a method and apparatus for producing 0 degree light and 180 degree phase shifted light having substantially equal intensities as both lights exit an alternating phase shift reticle. A material is inserted within the etched portion of the 180 degree phase shift channel of a reticle, wherein the material contains an index of refraction such that the first order light (+1, -1) is propagated through the 180 degree channel. The end result is a 180 degree phase shifted light having an intensity substantially equal to that of the 0 degree light.
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申请公布号 |
US6524751(B1) |
申请公布日期 |
2003.02.25 |
申请号 |
US20000519357 |
申请日期 |
2000.03.06 |
申请人 |
MICRON TECHNOLOGY, INC. |
发明人 |
STANTON WILLIAM A.;AGARWAL VISHNU K. |
分类号 |
G03F1/00;(IPC1-7):G03F9/00;G03C5/00 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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