发明名称 Reticle design for alternating phase shift mask
摘要 The present invention provides a method and apparatus for producing 0 degree light and 180 degree phase shifted light having substantially equal intensities as both lights exit an alternating phase shift reticle. A material is inserted within the etched portion of the 180 degree phase shift channel of a reticle, wherein the material contains an index of refraction such that the first order light (+1, -1) is propagated through the 180 degree channel. The end result is a 180 degree phase shifted light having an intensity substantially equal to that of the 0 degree light.
申请公布号 US6524751(B1) 申请公布日期 2003.02.25
申请号 US20000519357 申请日期 2000.03.06
申请人 MICRON TECHNOLOGY, INC. 发明人 STANTON WILLIAM A.;AGARWAL VISHNU K.
分类号 G03F1/00;(IPC1-7):G03F9/00;G03C5/00 主分类号 G03F1/00
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