ORGANOSILOXANE-BASED POLYMER, PHOTOCURABLE RESIN COMPOSITION, METHOD FOR FORMING PATTERN AND FILM FOR PROTECTING SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To produce a photocurable resin composition capable of being exposed by lights having wide wave lengths by using a novel organosiloxane-based polymer. SOLUTION: This organosiloxane-based polymer has a repeating unit expressed by formula (1) [R<1> to R<4> express each a monovalent hydrocarbon group; m expresses 1-2,000 integer; X has a structure expressed by formula (2) (Me denotes methyl); R<5> s express functional organic groups expressed by formula (3) (R' expresses H or methyl; R" expresses a divalent hydrocarbon group) which may be the same or different.