| 摘要 |
PROBLEM TO BE SOLVED: To provide a stain wiping-off material made of polyurethane foam and has sufficient water retentivity and stain wiping-off properties, and to provide a method for manufacturing the same. SOLUTION: The stain wiping-off material removes stain on the surface of a silicon wafer subjected to chemical-mechanical polishing, is subjected to film-removing treatment and is made of polyurethane foam, having a three- dimensional mesh structure. Silicon is not contained in the polyurethane foam, at the same time, a cell diameter is 300 to 3,000μm. Especially, the cell diameter is 500 to 2,000μm, and is further preferably 1,000 to 1,500μm. The polyurethane foam enables a foam raw material containing a surface-active agent other than a silicone-based one, an amine catalyst, and to make water react. After that, the polyurethane foam can be manufactured by film-removing treatment. As surface-active agent, preferably a nonion-based nonionic surface-active agent is used. Additionally, preferably metal catalysts are not used. |
