LIGHTNESS CORRECTING METHOD, SELECTIVE DEFECT DETECTING METHOD AND RECORDING MEDIUM RECORDING THE METHODS

摘要

PROBLEM TO BE SOLVED: To provide a lightness correcting method for a wafer surface, a selective defect detecting method for different patterns, and a recording medium recording these methods. SOLUTION: The lightness of images with lightness difference can be corrected by using the average and standard deviation of each picture element that divides a wafer. Defects can be selectively detected by distinguishing a metallic wiring pattern from a space to apply different critical values to the respective patterns, that is, only a bridge having fatal influence on a semiconductor element can be detected without detecting grain. Selecting ability in defect detection is thereby improved to more efficiently manage a defect detecting process.