PHASE SHIFTING MASK AND METHOD FOR PRODUCING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a phase shifting mask capable of relatively easily suppressing size variation and dislocation of a pattern in projection exposure with an error in production nearly equal to that in the case of a conventional bored phase shifting mask by making the intensity of transmitted light from bored regions and that from unbored regions nearly equal to each other in a bored phase shifting mask. SOLUTION: The phase shifting mask is constructed in such a way that the maximum intensity of transmitted light from bored regions and that from unbored regions are made nearly equal to each other on an image surface by embedding absorbent media in the unbored regions to lower the intensity of transmitted light.