发明名称 SUBSTRATE PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To increase assembling workability by eliminating anti-corrosion coating of the housing in a CVD apparatus. SOLUTION: A main housing 2A for installing a boat elevator and a wafer transfer device therein is provided with a bottom plate 31, which is formed of a stainless steel plate and is adjusted for flatness and levelness in advance. In the periphery of the bottom plate 31, a plurality of columns 32 formed of stainless shape steel are erected and welded, with beams 33 and crosspieces 34, formed of stainless shape steel which is laid and welded between the columns 32 and 32. With the columns 32, the beams 33, and the crosspieces 34 assembled, a boat elevator and a wafer transfer device are installed on the bottom plate 31, and thereafter a plurality of side plates 36 are fastened by screws 38 to front and rear side faces and right and left side faces of the main housing 2A. Thus by eliminating the anti-corrosion coating, generation of particles or organic materials from a coating film can be prevented, and by installing interior items in the main housing after removing the side plates, the time required for assembling and maintenance/inspection can be shortened, and increasing the working efficiency and accuracy.
申请公布号 JP2003051451(A) 申请公布日期 2003.02.21
申请号 JP20010235997 申请日期 2001.08.03
申请人 HITACHI KOKUSAI ELECTRIC INC 发明人 ISHIZUKA TAKAHARU;NAKAGAWA NAOYUKI
分类号 C23C16/44;H01L21/205;(IPC1-7):H01L21/205 主分类号 C23C16/44
代理机构 代理人
主权项
地址