发明名称 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR PRODUCING RESIST PATTERN AND METHOD FOR PRODUCING PRINTED WIRING BOARD
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive resin composition excellent in photosensitivity, resolution, adhesion and solubility in a developing solution and a photosensitive element using the composition. SOLUTION: The photosensitive resin composition comprises (A) a binder polymer, (B) a photopolymerizable monomer containing an ethylenically unsaturated group, (C) a polycyclic aromatic hydrocarbon, (D) a photopolymerization initiator and (E) a hydrogen donor. The photosensitive element is obtained by forming a resist layer comprising the photosensitive resin composition on a support.
申请公布号 JP2003050459(A) 申请公布日期 2003.02.21
申请号 JP20010239622 申请日期 2001.08.07
申请人 HITACHI CHEM CO LTD 发明人 ABE TAKUJI;OTOMO SATOSHI;ITAGAKI KATSUTOSHI;ICHIKAWA TATSUYA
分类号 G03F7/004;G03F7/031;H05K3/06;H05K3/18 主分类号 G03F7/004
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