发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR PRODUCING RESIST PATTERN AND METHOD FOR PRODUCING PRINTED WIRING BOARD |
摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition excellent in photosensitivity, resolution, adhesion and solubility in a developing solution and a photosensitive element using the composition. SOLUTION: The photosensitive resin composition comprises (A) a binder polymer, (B) a photopolymerizable monomer containing an ethylenically unsaturated group, (C) a polycyclic aromatic hydrocarbon, (D) a photopolymerization initiator and (E) a hydrogen donor. The photosensitive element is obtained by forming a resist layer comprising the photosensitive resin composition on a support. |
申请公布号 |
JP2003050459(A) |
申请公布日期 |
2003.02.21 |
申请号 |
JP20010239622 |
申请日期 |
2001.08.07 |
申请人 |
HITACHI CHEM CO LTD |
发明人 |
ABE TAKUJI;OTOMO SATOSHI;ITAGAKI KATSUTOSHI;ICHIKAWA TATSUYA |
分类号 |
G03F7/004;G03F7/031;H05K3/06;H05K3/18 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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