| 摘要 |
PROBLEM TO BE SOLVED: To provide a film deposition method for a photocatalytic titanium dioxide film in which a sputtering apparatus is reduced in size and cost without adding a heater to the apparatus, the throughput of the apparatus is increased by eliminating heating in vacuum and productivity is enhanced by increasing film deposition rate. SOLUTION: A dual magnetron device and PEM(photoelectromagnetic) control are used in a sputtering apparatus, high-speed film deposition of a titanium dioxide film is carried out on the surface of a substrate by non-heat sputtering and the film is fired in the air to obtain the objective photocatalytic titanium dioxide film. By this film deposition method, the photocatalytic titanium dioxide film can be made as thin as 25-50 nm, film deposition time is shortened, cost is reduced and productivity is enhanced. Since a heating zone is made unnecessary in the sputtering apparatus, the cost of equipment and running cost can be saved.
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