发明名称 METHOD AND APPARATUS FOR NON-DESTRUCTIVE TARGET CLEANLINESS CHARACTERIZATION BY TYPES OF FLAWS SORTED BY SIZE AND LOCATION
摘要 A preferred, non-destructive method for characterizing sputter target cleanliness includes the steps of sequentially irradiating the test sample (52') with sonic energy (62') predominantly of target sputter track areas; detecting echoes (64') induced by the sonic energy (62'); and discriminating texture-related backscattering noise from the echoes (64') to obtain modified amplitude signals. These modified amplitude signals are compared with one or more calibration values so as to detect flaw data points at certain positions or locations where the comparison indicates the presence of at least one flaw (72'). Most preferably, groups of the flaw data pixels corresponding to single large flaws are bound together so as to generate an adjusted set of flaw data points in which each group is replaced with a single, most significant data point. The adjusted set of flaw data points is used to calculate one or more cleanliness factors, or to plot a histogram, which characterizes the cleanliness sample.
申请公布号 WO03014718(A2) 申请公布日期 2003.02.20
申请号 WO2002US23362 申请日期 2002.07.23
申请人 TOSOH SMD, INC.;LEYBOVICH, ALEXANDER 发明人 LEYBOVICH, ALEXANDER
分类号 G01N29/04;C23C14/34;C23C14/56;G01N29/11;G01N29/30;G01N29/34;G01N29/44;G01N29/48;G01R33/465 主分类号 G01N29/04
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