发明名称 METHOD FOR H2 RECYCLING IN SEMICONDUCTOR PROCESSING SYSTEM
摘要 A system and method for conserving and/or recycling hydrogen used in processing operations. The present invention can be used with any conventional reactor, which supports semiconductor processes using hydrogen. Hydrogen is pumped into the reactor from a hydrogen gas supply chamber. The hydrogen is used in the reactor as needed to perform the process function. The hydrogen accompanied with other process gases is exhausted from the reactor. The exhausted gases are routed through a scrubber, which is used to separate the hydrogen from the other gases. The other gases are allowed to vent from the system in a typical manner. The hydrogen is then pumped through an H2 purifier, which cleans the hydrogen gas making the gas once again useable in the semiconductor process.
申请公布号 WO02081788(A9) 申请公布日期 2003.02.20
申请号 WO2002US10487 申请日期 2002.04.04
申请人 WAFERMASTERS, INCORPORATED 发明人 YOO, WOO, SIK
分类号 B01D53/96;C23C16/44;C23C16/448;C23C16/455;C30B25/02;(IPC1-7):C30B25/02 主分类号 B01D53/96
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