| 摘要 |
<p>A substrate protection and transport system and method for transitioning a substrate from atmospheric pressure to vacuum in a lithography tool. The system includes one or more removable substrate transport cassettes (111). Each cassette has at least one vent and at least one filter. The system further includes an end effector (113) coupled to a robotic arm (115) to enable the substrate (109) to be positioned within one of the cassettes (111), thereby forming a cassette-substrate arrangement. The system further includes a box (701) having a base (711) and a lid (713). The box (701) holds one or more of the cassette-substrate arrangements. In this way, a box-cassette-substrate arrangement is provided. To transport the substrate, the substrate (109) is first loaded into a removable substrate transport cassette (111). Next, the cassette-substrate arrangement is loaded into the box (701). The box-cassette-substrate arrangement is then transported to a shelf of an out of vacuum storage rack.</p> |
