| 摘要 |
An optical system is presented for use in a measurement system (OS) for measuring in patterned structures, which is particularly useful controlling processing of the structure progressing on a production line. The system comprises (OS) an illuminator unit (10) producing illuminating light to be directed to the structure to produce returned light, a detector unit comprising an imaging detector (26) and a spectrophotometer detector (30), and a light directing assembly (31). The light directing assembly (31) defines first and second optical paths for the light propagation. The optical elements accommodated in the first optical path affect the light to provide a relatively small measuring area of the structure's plane. The second optical path is located outside the first optical path, the light propagation through the second optical path providing a relatively large measuring area, as compared to that of the first optical path. |
