发明名称 ROTATING SUSCEPTOR AND METHOD OF PROCESSING SUBSTRATES
摘要 <p>A semiconductor processing reactor (100A) includes a rotating susceptor (106A) having at least one substrate holder (112) for supporting a substrate (120) during processing. A susceptor motor (318) is coupled to the rotating susceptor (106A) and a substrate holder motor (362) is coupled to the substrate holder (112). The susceptor motor (318) controls the rotation of the rotating susceptor (106A) and the substrate holder motor (362) controls the rotation of the substrate holder (112). This allows the rotating susceptor (106a) to be rotated independent of the rotation of the substrate holder (112). Further, the substrate holder (112) lifts the substrate (120) above the rotating susceptor (106A) allowing automated loading and unloading of the substrate (120).</p>
申请公布号 WO2003014414(A1) 申请公布日期 2003.02.20
申请号 US2002021809 申请日期 2002.07.09
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