METHOD AND APPARATUS FOR ATTRACTION OF SUBSTRATE

摘要

PURPOSE: To provide a method and an apparatus wherein a necessary and sufficient attractive force can be generated during the attraction of a substrate irrespective of the length of the attraction time of the substrate or irrespective of a timing for treating the substrate, and the substrate can be removed easily after the finish of its attraction. CONSTITUTION: The substrate attraction apparatus is provided with an electrostatic chuck 6 which attracts the substrate 4 due to static electricity and a DC power supply 14 which applies a DC attraction voltage VC to the electrostatic chuck 6. After the attraction of the substrate 4 has been started, the magnitude of the attraction voltage VC is reduced exponentially with reference to the attraction time. Its control is performed by a controller 20 in this example.