| 摘要 |
A method of depositing a waveguide core in a trench formed between opposed sidewalls of adjacent first and second cladding structures of a planar substrate. The method comprises the steps of depositing a waveguide material in the trench, preferentially etching the deposited waveguide material at or near upper regions of the opposed sidewalls, and controlling at least one parameter of the deposition process so as to form a waveguide core in the trench from the deposited waveguide material. The preferential etching step may be conducted in a manner which increases optical confinement in the deposited waveguide core in the trench, or in a manner which reduces shadowing effects in the trench.
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