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发明名称
MASK AND METHOD FOR PRODUCING A MASK
摘要
<p>Die Erfindung betrifft eine hinsichtlich Herstellung und Handhabung verbesserte Maske, insbesondere zur Verwendung bei der Elektronen-Projektions-Lithografie, und ein Herstellungsverfahren für Masken.</p>
申请公布号
WO2003014829(A1)
申请公布日期
2003.02.20
申请号
EP2002007824
申请日期
2002.07.13
申请人
发明人
分类号
主分类号
代理机构
代理人
主权项
地址
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