| 摘要 |
A method of conducting a laser repair operation. A silicon wafer has a plurality of chips thereon. Each chips has a plurality of bonding pads, a plurality of testing pads, a plurality of fuses and a passivation layer for protecting the chips. The passivation layer exposes the bonding pads and the testing pads. A bump-forming process is conducted to form a bottom metallic layer and a bump sequentially over each bonding pad. Only a bottom metallic layer is formed over each testing pad. The bumps are formed, for example, by electroplating or printing. Testing is carried out by probing various bottom metallic layers above the testing pads. Finally, a laser repair is conducted. |
