| 摘要 |
Epoxy compounds of formula (1) are provided wherein W is CH2, O or S, X and Y are -CR1R2- or -C(=O)-, k is 0 or 1, R1 and R2 are H or alkyl, or R1 and R2, taken together, may form an aliphatic hydrocarbon ring with the carbon atom to which they are connected. A resist composition comprising a polymer having recurring units of the epoxy compound as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, etching resistance, and minimized swell and lends itself to micropatterning with electron beams or deep-UV.
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