发明名称 CHEMICAL SUPPLY SYSTEM IN FABRICATION PROCESS OF SEMICONDUCTOR DEVICE
摘要 PURPOSE: A chemical supply system in a fabrication process of a semiconductor device is provided to purge a transferring tube by using gases supplied to a storage tank. CONSTITUTION: A receptacle(110) is used for receiving chemicals(116). A cover(114) is installed on an upper portion of the receptacle(110). A chemical transferring tube(120) is installed at the outside of the receptacle(110) in order to supply the chemicals(116) to a processing apparatus(200). A gas injection tube(130) is installed at ones side of the cover(114) in order to inject helium gas into the inside of the receptacle(110). A purge tube(140) is used for connecting the chemical transferring tube(120) with the gas injection tube(130). A three-wafer valve(150) is installed at a connection portion between the gas injection tube(130) and the purge tube(140). The three-wafer valve(150) is installed at the connection portion between the chemical transferring tube(120) and the purge tube(140).
申请公布号 KR20030014846(A) 申请公布日期 2003.02.20
申请号 KR20010048729 申请日期 2001.08.13
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 CHOI, JUN U
分类号 H01L21/02;(IPC1-7):H01L21/02 主分类号 H01L21/02
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