发明名称 |
CHEMICAL SUPPLY SYSTEM IN FABRICATION PROCESS OF SEMICONDUCTOR DEVICE |
摘要 |
PURPOSE: A chemical supply system in a fabrication process of a semiconductor device is provided to purge a transferring tube by using gases supplied to a storage tank. CONSTITUTION: A receptacle(110) is used for receiving chemicals(116). A cover(114) is installed on an upper portion of the receptacle(110). A chemical transferring tube(120) is installed at the outside of the receptacle(110) in order to supply the chemicals(116) to a processing apparatus(200). A gas injection tube(130) is installed at ones side of the cover(114) in order to inject helium gas into the inside of the receptacle(110). A purge tube(140) is used for connecting the chemical transferring tube(120) with the gas injection tube(130). A three-wafer valve(150) is installed at a connection portion between the gas injection tube(130) and the purge tube(140). The three-wafer valve(150) is installed at the connection portion between the chemical transferring tube(120) and the purge tube(140).
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申请公布号 |
KR20030014846(A) |
申请公布日期 |
2003.02.20 |
申请号 |
KR20010048729 |
申请日期 |
2001.08.13 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
CHOI, JUN U |
分类号 |
H01L21/02;(IPC1-7):H01L21/02 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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