| 摘要 |
PURPOSE: A compact system of a photoresist solution coating and developing equipment for a semiconductor wafer is provided to be capable of minimizing the occupancy size of the equipment by stacking each demanded process unit on the equipment. CONSTITUTION: A compact system of a photoresist solution coating and developing equipment is provided with an indexer(40) for loading and unloading a wafer, the first robot(50) installed at one side of the indexer for transferring the wafer to each process unit, the first and second module(M1,M2) selectively installed at both sides of the first robot, the second robot(60) installed and located on the same line as the first robot using the first interface(IF1), and an exposure apparatus(70) installed and connected with the second interface(IF2). At this time, the first module includes a bake unit and a spin unit stacked on the bake unit, and the second module includes a WEE(Wide Expose Edge) unit and the spin unit stacked on the WEE unit.
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