Position detecting method, position detecting unit, exposure method, exposure apparatus, and device manufacturing method

摘要

The imaging signal (the raw waveform) and the modified waveform are obtained, wherein the raw waveform is obtained from the image of the mark which is picked-up by the image pick-up device, and the modified waveform is obtained through the modification of the imaging signal by the waveform modifying unit. By using respective raw wave form and modified waveform, the mark information calculating unit obtains the mark information for the mark position such as estimated mark position and so forth. Then, the position calculating unit detects the positional information of the mark based on the plural mark information in the obtained mark information. As a result, the mark position might be precisely detected depending on the figure of the noise signal.