发明名称 |
CVD apparatus |
摘要 |
An improved CVD apparatus for depositing a uniform film is shown. The apparatus comprises a reaction chamber, a substrate holder and a plurality of light sources for photo CVD or a pair of electrodes for plasma CVD. The substrate holder is a cylindrical cart which is encircled by the light sources, and which is rotated around its axis by a driving device. With this configuration, the substrates mounted on the cart and the surroundings can be energized by light of plasma evenly throughout the surfaces to be coated.
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申请公布号 |
US6520189(B1) |
申请公布日期 |
2003.02.18 |
申请号 |
US19990398059 |
申请日期 |
1999.09.17 |
申请人 |
SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
发明人 |
INUSHIMA TAKASHI;HAYASHI SHIGENORI;TAKAYAMA TORU;ODAKA MASAKAZU;HIROSE NAOKI |
分类号 |
C23C16/02;C23C16/40;C23C16/44;C23C16/48;C23C16/517;C23C16/56;H01L21/316;(IPC1-7):B08B3/12;B44C1/22 |
主分类号 |
C23C16/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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