发明名称 Bipolar transistor and manufacturing method thereof
摘要 A bipolar transistor according to the invention is provided with structure that an intrinsic base made of single crystal Si-Ge and a base leading-out electrode are connected via a link base made of polycrystal Si-Ge by doping at high concentration, further, a part immediately under the intrinsic base has the same conductive type as that of a collector and in a peripheral part, a single crystal Si-Ge layer having the same conductive type as that of a base is provided between the intrinsic base and a collector layer. Hereby, the reduction of the resistance of the link base between the intrinsic base and the base leading-out electrode and the reduction of capacitance between the collector and the base are simultaneously realized, and a self-aligned bipolar transistor wherein capacitance between an emitter and the base and capacitance between the collector and the base are respectively small, power consumption is small and high speed operation is enabled is acquired.
申请公布号 US6521974(B1) 申请公布日期 2003.02.18
申请号 US20000689800 申请日期 2000.10.13
申请人 HITACHI, LTD.;HITACHI DEVICE ENGINEERING CO., LTD. 发明人 ODA KATSUYA;OHUE EIJI;KONDO MASAO;WASHIO KATSUYOSHI;TANABE MASAMICHI;SHIMAMOTO HIROMI
分类号 H01L21/331;H01L29/732;H01L29/737;(IPC1-7):H01L29/70 主分类号 H01L21/331
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