Projection exposure method and apparatus

摘要

A projection exposure apparatus comprises a projection optical system for projecting a pattern of a mask on a photosensitive substrate; a plane-parallel plate disposed on a side of the photosensitive substrate of the projection optical system, almost perpendicularly to an optical axis of the projection optical system; and a adjustment device for adjusting at least one of an inclination angle of a normal line of the plane-parallel plate relative to the optical axis of the projection optical system and an inclination angle of the plane-parallel plate.