| 摘要 |
Provided is a bonding pad structure of a semiconductor device that is unlikely to give rise to an open failure caused by the electromigration in the pad wiring portion. The input-output signal current and the power supply current of the semiconductor chip flowing through the bonding wire is branched to flow from the bonding region into the underlying metal wiring through via metals. A via metal connecting region consisting of the underlying metal wiring layer is formed in the lower peripheral region of the bonding region so as to allow the current flowing from the bonding wire to be branched from the upper via metal connecting region formed in the bonding pad region into the underlying metal wiring connected to the underlying via metal connecting region through a plurality of via metals so as to moderate the current concentration and, thus, to avoid the open failure caused by the electromigration.
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