| 摘要 |
According to one aspect of the present invention, there is provided a method for controlling of charged particle beam to compensate for a potential being present on a specimen, the method comprising the steps of: moving a charged particle beam over the specimen; measuring at least one secondary product and/or backscattered particles coming from the specimen to produce an image signal; scoring the image signal; changing the beam energy; analyzing the scores achieved with different beam energies; and adjusting the beam energy based on the analysis, to compensate for the potential being present on the specimen.
|
