发明名称 Exposure apparatus having projection optical system with aberration correction element
摘要 A static image distortion characteristic is averaged in the width of a projection area in a scanning direction and becomes a dynamic image distortion characteristic, when a mask pattern is scan-exposed onto a photosensitized substrate by a projection exposure apparatus. At least a random component included in the dynamic image distortion characteristic is corrected by a arranging an image correction plate obtained by locally polishing the surface of a transparent parallel plate. Correction plates which minimize other aberrations beforehand are manufactured and installed within a projection optical path, considering that also the other aberrations are averaged and become dynamic aberration characteristics at the time of scan-exposure.
申请公布号 US6522386(B1) 申请公布日期 2003.02.18
申请号 US20000502042 申请日期 2000.02.11
申请人 NIKON CORPORATION 发明人 NISHI KENJI
分类号 G03F7/20;(IPC1-7):G03B27/68;G03B27/42;G03B27/72 主分类号 G03F7/20
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