发明名称 |
Split gate memory cell with a floating gate in the corner of a trench |
摘要 |
A memory cell and method for making a memory cell. The memory cell has a floating gate and a control gate, and a source region and a drain region. The structure of the device is such that the area of capacitive coupling between the floating gate and the source region is oriented along a sidewall of a trench formed in a substrate. The drain region is disposed under the bottom of the trench.
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申请公布号 |
US6521944(B1) |
申请公布日期 |
2003.02.18 |
申请号 |
US20010925662 |
申请日期 |
2001.08.09 |
申请人 |
NATIONAL SEMICONDUCTOR CORPORATION |
发明人 |
MIRGORODSKI YURI |
分类号 |
H01L21/28;H01L21/336;H01L29/423;H01L29/788;(IPC1-7):H01L29/788 |
主分类号 |
H01L21/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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