发明名称 Split gate memory cell with a floating gate in the corner of a trench
摘要 A memory cell and method for making a memory cell. The memory cell has a floating gate and a control gate, and a source region and a drain region. The structure of the device is such that the area of capacitive coupling between the floating gate and the source region is oriented along a sidewall of a trench formed in a substrate. The drain region is disposed under the bottom of the trench.
申请公布号 US6521944(B1) 申请公布日期 2003.02.18
申请号 US20010925662 申请日期 2001.08.09
申请人 NATIONAL SEMICONDUCTOR CORPORATION 发明人 MIRGORODSKI YURI
分类号 H01L21/28;H01L21/336;H01L29/423;H01L29/788;(IPC1-7):H01L29/788 主分类号 H01L21/28
代理机构 代理人
主权项
地址