发明名称 |
Thin-film semiconductor device fabrication method |
摘要 |
In the thin-film semiconductor device fabrication method according to the present invention, after forming an amorphous semiconductor film, the film is crystallized in the solid phase state, then a portion of the semiconductor film is molten by irradiating it with a pulsed laser beam having an absorption coefficient in amorphous silicon that is greater than the absorption coefficient in polysilicon. Thereby, polycrystalline thin-film semiconductor devices having superior characteristics can be fabricated.
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申请公布号 |
US6521492(B2) |
申请公布日期 |
2003.02.18 |
申请号 |
US20010876132 |
申请日期 |
2001.06.08 |
申请人 |
SEIKO EPSON CORPORATION;MITSUBISHI DENKI KABUSHIKI KAISHA |
发明人 |
MIYASAKA MITSUTOSHI;TOKIOKA HIDETADA;OGAWA TETSUYA |
分类号 |
H01L21/20;H01L21/336;H01L21/77;H01L27/12;H01L29/04;H01L29/786;(IPC1-7):H01L21/00;H01L21/84;H01L21/44 |
主分类号 |
H01L21/20 |
代理机构 |
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代理人 |
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地址 |
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