发明名称 Mos transistor and dram cell configuration
摘要 A MOS transistor includes an upper source/drain region, a channel region, and a lower source/drain region that are stacked as layers one above the other and form a projection of a substrate. A gate dielectric adjoins a first lateral area of the projection. A gate electrode adjoins the gate dielectric. A conductive structure adjoins a second lateral area of the projection in the region of the channel region. The conductive structure adjoins the gate electrode.
申请公布号 US6521935(B2) 申请公布日期 2003.02.18
申请号 US20010027524 申请日期 2001.12.26
申请人 INFINEON TECHNOLOGIES AG 发明人 KRAUTSCHNEIDER WOLFGANG;SCHLOESSER TILL;WILLER JOSEF
分类号 H01L21/336;H01L21/8242;H01L27/108;H01L29/78;H01L29/786;(IPC1-7):H01L27/108;H01L29/76;H01L29/94;H01L31/119 主分类号 H01L21/336
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