| 摘要 |
PURPOSE: A structure of plasma deposition equipment is provided to prevent an occurrence of a static electricity due to a mutual contact between an S/F and an LCD substrate by increasing the height of an S/F support member and the LCD. CONSTITUTION: A DSS(31) is operated like an anode. An LCD substrate(33) deposits with a target(32). A susceptor(34) is installed on the LCD substrate(33). An S/F(35) is installed at both side upper ends of the susceptor(34) in order to prevent a metal from being deposited at the edge of the LCD substrate(33). An S/F support member(41) supports the S/F(35). The S/F support member(41) has a column shape. When the LCD substrate(33) is loaded on a vacuum robot and enters in a deposition. The S/F(35) and the LCD substrate(33) are deposited by a metal in a state that a gap greater than 2.5 mm is maintained. The S/F support member(41) is formed by an insulator.
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