| 摘要 |
PURPOSE: A photoresist polymer, a photoresist composition containing the polymer and a fluorescent membrane composition containing the polymer are provided to improve the storage stability and the sensitivity of a photoresist polymer and to reduce the environmental pollution due to the photoresist polymer. CONSTITUTION: The photoresist polymer is represented by the formula 1, R1 is (R)α(CH2) βR' or (R)α((CH2)mO)γR'(wherein R is CO, CO2, O, OCO or OCO2, R' is O, CO2 or OCO2, α is 0 or 1, β is an integer of 0-5, m is 1 or 2, and γ is an integer of 1-5; R2, R3 and R4 are H, a saturated alkyl group of C1-C5, an unsaturated alkyl group, an aromatic group, an ether, a carbonyl group, an amine or an alcohol group; X is an integer of 1-5; a is 0.6-0.99, b is 0-0.1, c is 0.01-0.3 and a+b+c = 1; and n is the degree of polymerization, which is 2 or more). The photoresist composition comprises the photoresist polymer; and a photoacid generator. The fluorescent membrane composition comprises the photoresist polymer; a photoacid generator; and a fluorescent substance. |
