发明名称 METHOD FOR MANUFACTURING LIQUID DISCHARGING HEAD, SUBSTRATE FOR LIQUID DISCHARGING HEAD AND METHOD FOR PROCESSING SURBSTRATE
摘要 PURPOSE: A method for manufacturing a liquid discharging head, a substrate for the liquid discharging head and a method for processing the substrate are provided to supply a method for manufacturing an ink jet recording head for stably setting an opened width of an ink supply port, which is formed on the surface of the substrate by the anisotropic etching of Si, with high accuracy in a predetermined width. CONSTITUTION: An ink supply port(9) is opened in an Si substrate(1) on which an ink discharge energy generating element(2) is formed, by anisotropic etching from a back surface opposite to a surface on which the ink discharge energy generating element is formed. When the anisotropic etching is effected, an OSF(Oxidation Induced Laminate Defect) remains on the back surface of the Si substrate with OSF density equal to or greater than 2x10¬4 parts/cm¬2 and a length of the OSF equal to or greater than 2 micro meter.
申请公布号 KR20030014175(A) 申请公布日期 2003.02.15
申请号 KR20020047291 申请日期 2002.08.10
申请人 CANON KABUSHIKI KAISHA 发明人 KOYAMA SHUJI;NAGATA SHINGO;OZAKI TERUO
分类号 B41J2/175;B41J2/16;(IPC1-7):B41J2/175 主分类号 B41J2/175
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